Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa's Advances in CMP Polishing Technologies PDF

By Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

ISBN-10: 0128103566

ISBN-13: 9780128103562

ISBN-10: 1437778593

ISBN-13: 9781437778595

CMP and sharpening are the main detailed approaches used to complete the surfaces of mechanical and digital or semiconductor elements. Advances in CMP/Polishing applied sciences for Manufacture of digital units provides the newest advancements and technological suggestions within the box – making state-of-the-art R&D obtainable to the broader engineering group.

Most of the functions of those approaches are saved as personal as attainable (proprietary information), and particular info usually are not obvious in expert or technical journals and magazines. This publication makes those procedures and functions available to a much wider business and educational audience.

Building at the basics of tribology – the technology of friction, put on and lubrication – the authors discover the sensible functions of CMP and sprucing throughout numerous marketplace sectors. as a result of excessive speed of improvement of the electronics and semiconductors undefined, some of the awarded methods and purposes come from those industries.

  • Demystifies medical advancements and technological suggestions, beginning them up for brand spanking new purposes and strategy advancements within the semiconductor and different parts of precision engineering
  • Explores inventory removing mechanisms in CMP and sprucing, and the demanding situations occupied with predicting the results of abrasive methods in high-precision environments
  • The authors compile the newest options and examine from the us and Japan

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Advances in CMP Polishing Technologies by Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa


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